NanoVapor Matrix
Advanced MOCVD Deposition for 2D Transition Metal Dichalcogenides
Advanced MOCVD Technology
Wafer-Scale Growth
200-mm wafer-scale integration with uniform polycrystalline MoS₂ transistors
Oxygen-Assisted Control
Enhanced nucleation control for larger domain sizes and fewer defects
Precise Temperature Control
Optimized growth temperatures between 500°C and 1000°C
4+
TMD Materials
200mm
Wafer Scale
99%
Uniformity
500-1000°C
Growth Range